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Coater

SC-701HMC

Coater
개요
3kV Ion Sputter
*Highly suitable for the experiments and
|research of thin-film  
|forming using high melting point metals.

특징

1. Magnetron cathode minimizes sample damage.
2. 0–3 kV variable voltage enables deposition and thickness control of high-melting-point metal films.
3. Ideal for SEM sample preparation.

SPEC

Standard Target

50mm dia./AuX1(for coating)

Sample Base

70min dia(Height adjustment range - 15, 20, 60 mm)

Sputtering System

DC Magnetron Sputtering/Parallel-plate type

Evacuation operation & Vacuum of Degree

Manual / 10Pa

High Voltage Power Supply

0~3kV/0~20mA

Chamber Size

120(dia.) x 120(depth)mm (Made of stainless steel)

Dimensions and Weight

Main unit : 225(W) X 420(D) X 320(H)mm, 15kg

RP : 350(W) X 160(D) X 200(H)mm, 11kg

Power SupplySingle Phase AC 100V 50/60Hz 10A