CONTACT
Coater
특징
1. Compatible with deposition of W, Ti, Ni, Cr, and other materials.
2. Equipped with a magnetron sputtering head.
3. Microcomputer-controlled system for high-precision thin-film deposition.
4. Full Auto / Manual operation modes.
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SPEC |
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Target size & Sample Base |
Φ49mm / Φ70mm |
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Operation of evacuation |
Automatic |
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Sputtering System | DC Magnetron Sputtering |
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High Voltage Power Supply |
0~5mA/0~3kV(system control) |
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Gas regulating mechanism |
Needle valve(system control) |
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Chamber Size |
160(Φ) X 160(D)mm (SUS) |
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Dimensions and Weight |
Main unit : 360(W) X 422(D) X 265(H)mm, 20kg RP : 460.5(W) X 173.5(D) X 264(H)mm, 22.4kg |
Power Supply | Single Phase AC 100V 50/60Hz 10A |